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Small Wafer Nitrogen UV Curing System Tape LED UV Curing Box Small Wafer Nitrogen UV Curing System Tape LED UV Curing Box Small Wafer Nitrogen UV Curing System Tape LED UV Curing Box

Small Wafer Nitrogen UV Curing System Tape LED UV Curing Box

Nitrogen UV Curing System Tape Led,Compact and Practical UV Curing system, 5 seconds for The Film to Detach from The Wafer, Adjustable Time, Adjustable illumination, Nitrogen Protection


  • model no. :

    DSXUV-100x100-N2
  • Color :

    White
  • port of dispatch :

    Shenzhen
  • Payment :

    T/T before shipment
  • original region :

    China
  • Lead Time :

    10-15 days
Product Details

The Nitrogen UV Curing Box is an equipment that performs UV curing process in an inert gas (nitrogen) environment, mainly used for efficient curing of photosensitive materials such as inks, coatings, adhesives, etc. Its core features and advantages are as follows:

Model

DSXUV100X100-N2

Factory

Shenzhen Deshengxing Electr
onics  

Size

L330*W376*H414mm

Gas

Nitrogen

Drawer capacity

115*115*100mm

Light source area

100X100mm

Wavelength


UVLED365nm /Other wavelengths can be customized

Power


300W


illuminance

10-600mW/cm2 adjustable

Voltage

100-240V AC 50-60HZ

Material

White sheet metal

Function

Adjustable time and illumination, 10% -100% adjustable

Illumination direction

Illuminate from top to bottom

Language

Touch screen/English

Energy conservation and environmental protection

Low energy consumption: Rapid solidification reduces energy consumption, and nitrogen can be recycled to reduce gas consumption.

Ozone free production: A closed environment is used to prevent UV lamps from producing ozone, reducing pollution and health risks.


2、Core advantages of Nitrogen UV Curing system

Efficient curing performance

Eliminating oxygen blocking polymerization: The nitrogen environment reduces the interference of oxygen on free radical reactions, significantly improving the efficiency of deep and surface curing.

Shorten curing time: 30% -50% faster than traditional air environments, especially suitable for high crosslink density materials.

Improve surface quality

Anaerobic inhibition: avoids surface sticking, atomization and other defects after curing, achieving a high gloss and smooth coating effect.

Reduce bubbles: Inert environment reduces the risk of bubble formation from volatile substances.

Wafer Nitrogen UV Curing system


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